Prepareation and Microstructure of Silicon Nitride Thin Films Deposited by Hot Wire Chemical Vapor Deposition Method

BULLETIN OF THE CHINESE CERAMIC SOCIETY ›› 2017, Vol. 36 ›› Issue (2): 706-711.

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Prepareation and Microstructure of Silicon Nitride Thin Films Deposited by Hot Wire Chemical Vapor Deposition Method

DING De-song;ZHOU Bing-qing;BU Xin-xin;GAO Ai-ming

Online:2017-02-15 Published:2021-01-18

Abstract

CLC Number:

TK514

DING De-song;ZHOU Bing-qing;BU Xin-xin;GAO Ai-ming. Prepareation and Microstructure of Silicon Nitride Thin Films Deposited by Hot Wire Chemical Vapor Deposition Method[J]. BULLETIN OF THE CHINESE CERAMIC SOCIETY, 2017, 36(2): 706-711.

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Prepareation and Microstructure of Silicon Nitride Thin Films Deposited by Hot Wire Chemical Vapor Deposition Method

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