Effect of O Postimplantation on the Damage of H Implanted Crystalline Si

BULLETIN OF THE CHINESE CERAMIC SOCIETY ›› 2016, Vol. 35 ›› Issue (8): 2600-2603.

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Effect of O Postimplantation on the Damage of H Implanted Crystalline Si

WANG Zhuo;TIAN Guang;SHI Shao-bo

Published:2021-01-18

Abstract

CLC Number:

O483

WANG Zhuo;TIAN Guang;SHI Shao-bo. Effect of O Postimplantation on the Damage of H Implanted Crystalline Si[J]. BULLETIN OF THE CHINESE CERAMIC SOCIETY, 2016, 35(8): 2600-2603.

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[2]	WANG Zhuo;LIU Chang-long. Advances in Surface Damage on Crystalline Si Induced by Co-implantation of H and He Ions [J]. BULLETIN OF THE CHINESE CERAMIC SOCIETY, 2014, 33(8): 1996-2000.

Effect of O Postimplantation on the Damage of H Implanted Crystalline Si

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