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BULLETIN OF THE CHINESE CERAMIC SOCIETY ›› 2016, Vol. 35 ›› Issue (12): 4076-4081.

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Effects of N2/Ar Flow Ratio on Structure and Hardness of TiN Thin Films Deposited on Glass Substrates

GU Bao-bao;ZHAO Qing-nan;LIU Xu;LUO Le-ping;CONG Fang-ling;ZHAO Xiu-jian   

  • Published:2021-01-18

Key words: magnetron sputtering;TiN films deposited the glass substrate;hardness;flow ratio of N2/Ar

CLC Number: