Soft UV Nanoimprint Lithography Process Optimization for Plasmonic Nanohole Structures Fabrication

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BULLETIN OF THE CHINESE CERAMIC SOCIETY ›› 2011, Vol. 30 ›› Issue (4): 899-903.

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Soft UV Nanoimprint Lithography Process Optimization for Plasmonic Nanohole Structures Fabrication

CHEN Jing;LIU Zheng-tang;Anne-Marie Haghiri-Gosnet

Online:2011-08-15 Published:2021-01-18

Abstract

CLC Number:

O64

CHEN Jing;LIU Zheng-tang;Anne-Marie Haghiri-Gosnet. Soft UV Nanoimprint Lithography Process Optimization for Plasmonic Nanohole Structures Fabrication[J]. BULLETIN OF THE CHINESE CERAMIC SOCIETY, 2011, 30(4): 899-903.

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Soft UV Nanoimprint Lithography Process Optimization for Plasmonic Nanohole Structures Fabrication

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