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硅酸盐通报 ›› 2026, Vol. 45 ›› Issue (8): 2909-2918.DOI: 10.16552/j.cnki.issn1001-1625.2026.0138

• 玻璃 • 上一篇    下一篇

预辐照方法对石英玻璃抗辐照性能的影响

魏来1,2(), 吴俊豪3, 张晓彤3, 陈从一3, 高梓滔3, 凌雪2(), 靳柯1, 郭寻1, 王国彪4, 崔一南3()   

  1. 1.北京理工大学前沿交叉科学院,北京 100081
    2.中国地质大学(北京)工程技术学院,北京 100083
    3.清华大学航天航空学院,北京 100084
    4.天津大学机械工程学院,天津 300072
  • 收稿日期:2026-02-05 修订日期:2026-03-22 出版日期:2026-08-15 发布日期:2026-09-01
  • 通信作者: 凌 雪,博士,副教授。E-mail:lingxue@cugb.edu.cn
    崔一南,博士,副教授。E-mail:cyn@mail.tsinghua.edu.cn
  • 作者简介:魏 来(1998—),男,博士研究生。主要从事辐照损伤效应的研究。E-mail:3120256581@bit.edu.cn
  • 基金资助:
    国家重点研发计划项目资助(2022YFB4603000);国家重点研发计划项目资助(2022YFB4603005)

Effects of Pre-Irradiation Methods on Radiation Resistance of Silica Glass

WEI Lai1,2(), WU Junhao3, ZHANG Xiaotong3, CHEN Congyi3, GAO Zitao3, LING Xue2(), JIN Ke1, GUO Xun1, WANG Guobiao4, CUI Yinan3()   

  1. 1.School of Interdisciplinary Science,Beijing Institute of Technology,Beijing 100081,China
    2.School of Engineering and Technology,China University of Geosciences (Beijing),Beijing 100083,China
    3.School of Aerospace Engineering,Tsinghua University,Beijing 100084,China
    4.School of Mechanical Engineering,Tianjin University,Tianjin 300072,China
  • Received:2026-02-05 Revised:2026-03-22 Published:2026-08-15 Online:2026-09-01

摘要:

围绕石英玻璃在辐照环境下光学性能退化及恢复的问题,本文基于预辐照实验,系统研究了γ辐照诱导色心缺陷的形成规律,以及高温退火处理对石英玻璃抗辐照性能的影响机制。结果表明,γ辐照主要导致石英玻璃产生E’心缺陷,高温退火可显著促进E’心缺陷的湮灭。在本实验条件下,通过对比空气气氛和氢气气氛高温退火结果,发现空气气氛800 ℃退火是最优处理方式,退火后样品透光率相较处理前增长21.23%。进一步研究表明,空气气氛高温退火通过促进Si—O—Si网络结构重排,有效提高玻璃材料的抗辐照性能。相比之下,氢气气氛高温退火虽有效降低缺陷浓度,但退火过程中形成的Si—H键在二次辐照中易断裂,反而不利于抗辐照性能的长久提升。本文从光学性能与缺陷演化角度系统阐述了不同条件下的预辐照方法对石英玻璃抗辐照性能的影响机制,为延长辐照环境中光学玻璃与光纤材料的服役寿命提供了实验依据与理论参考。

关键词: E’心缺陷, 预辐照, 高温退火, 玻璃辐照损伤, 抗辐照性能

Abstract:

Silica glass and optical fibers are widely utilized in critical applications such as nuclear industry monitoring systems and remote sensing satellites due to their exceptional optical properties and robust radiation resistance. However, exposure to intense radiation can induce the formation of color center defects within the quartz glass matrix, which severely compromises its optical performance. Strategies to enhance the radiation resistance of glass materials are broadly categorized into pre-treatments and post-treatments. Pre-treatments improve material properties directly or indirectly via doping, gas loading and other techniques. Post-treatment approaches utilize photo-bleaching or thermal bleaching to facilitate the transformation or annihilation of radiation-induced color center defects, with thermal bleaching being extensively adopted due to its procedural simplicity and broad applicability. The pre-irradiation method employs a combination of initial irradiation and subsequent thermal annealing to eliminate the detrimental effects of precursor defects, thereby enhancing overall radiation resistance. Despite its potential, the optimal temperature ranges and annealing parameters require further clarification, and there is a noticeable lack of systematic comparative studies concerning defect evolution mechanisms under various annealing conditions. Based on pre-irradiation experiments, this study systematically investigates the formation dynamics of γ-irradiation-induced color center defects and the underlying mechanisms by which different high-temperature annealing behaviors influence radiation resistance.γ-irradiation experiments were conducted on a 1.25 MeV ??Co source platform at the China institute of atomic energy. The irradiation dose rate was maintained at 2 kGy/h, with total doses established at 1, 10, and 100 kGy. A systematic series of annealing treatments was subsequently conducted: room-temperature dark annealing for durations of 1, 3, and 6 months; high-temperature annealing in both air and hydrogen atmospheres at 400, 600, 800, and 1 000 ℃; and variable-duration isothermal annealing at 800 ℃ in an air atmosphere for 10, 20, 30, and 40 min. The annealed samples were then subjected to secondary irradiation at 2 kGy/h up to a total dose of 100 kGy. Changes in optical transmittance, alongside the types and concentrations of structural defects, were characterized using ultraviolet-visible (UV-Vis) spectrophotometry and electron paramagnetic resonance (EPR) spectroscopy.The experimental results demonstrate that γ-irradiation predominantly induces the generation of E’ center defects (g1=2.004 4, g2=2.003 5, g3=2.003 1), along with a minor presence of non-bridging oxygen hole centers (NBOHC). When the total irradiation dose reached 100 kGy, the sample exhibited a maximum transmittance degradation of 23.5% (primarily located in the ultraviolet band), while the E’ center concentration escalated to 2.228×1016 spins/g. Room-temperature annealing over a period of 6 months resulted in a marginal transmittance recovery of only 5.1%, primarily attributed to the gradual annihilation of NBOHC defects. In contrast, high-temperature annealing yielded significant restorative effects. The optimal treatment was identified as annealing at 800 ℃ in an air atmosphere, which improved the sample’s transmittance by 21.23% relative to its post-irradiation state. Crucially, following secondary irradiation, the transmittance of the samples annealed in air at 800 ℃ was 7.5% higher than their transmittance after the primary irradiation. Conversely, although annealing in a hydrogen atmosphere could successfully reduce defect concentrations in the short term, the newly formed Si-H bonds proved highly unstable and easily fractured during secondary irradiation, ultimately exacerbating the overall radiation damage.From the dual perspectives of optical performance and microstructural defect evolution, this paper systematically elucidates the mechanisms through which pre-irradiation methods under varying conditions impact the radiation resistance of quartz glass. These findings provide experimental foundation and theoretical reference for extending the operational service life of optical glass and fiber materials deployed in severe radiation environments.

Key words: E’ center, pre-irradiation, high temperature annealing, irradiation damage of glass, radiation resistance

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