热处理气氛对SiBON陶瓷材料析晶行为的影响

硅酸盐通报 ›› 2021, Vol. 40 ›› Issue (9): 3114-3121.

热处理气氛对SiBON陶瓷材料析晶行为的影响

张衡, 吴赟, 李道谦, 李卓霖, 王怡洋, 吴松松, 孙志远, 温广武

山东理工大学材料科学与工程学院,淄博 255000

收稿日期:2021-04-02 修回日期:2021-06-01 出版日期:2021-09-15 发布日期:2021-10-08
通讯作者: 吴赟,博士,副教授。E-mail:wuyunhit@163.com
温广武,博士,教授。E-mail:g_wen2016@163.com
作者简介:张衡(1997—),男,硕士研究生。主要从事SiBON陶瓷高温性能的研究。E-mail:865155216@qq.com
基金资助:
山东省重点研发计划(2019JMRH0402,2020JMRH0503);民用航天项目(D010501)

Effect of Heat Treatment Atmosphere on the Crystallization Behavior of SiBON Ceramic Materials

ZHANG Heng, WU Yun, LI Daoqian, LI Zhuolin, WANG Yiyang, WU Songsong, SUN Zhiyuan, WEN Guangwu

School of Materials Science and Engineering, Shandong University of Technology, Zibo 255000, China

Received:2021-04-02 Revised:2021-06-01 Online:2021-09-15 Published:2021-10-08

摘要/Abstract

摘要： 熔融石英陶瓷在使用过程中的析晶现象一直备受关注。采用XRD、SEM、FT-IR、XPS分析手段研究了SiBON陶瓷物相结构、表面形貌、化学键存在形式对其析晶行为的影响。结果表明,SiBON陶瓷在氮气保护条件下经1 550 ℃烧结后仍可有效抑制方石英的析出,同一温度在真空气氛下烧结制成的样品抑制析晶效果不佳。SiBON陶瓷的物相组成为非晶SiBON、Si₃N₄、BN,抑制析晶机理为B、N元素的掺杂使SiO₂中的Si—O—Si键转变为B—O—Si、Si—O—N键,由此生成的Si—B—O—N非晶结构提高了SiO₂的析晶活化能。

关键词: SiBON陶瓷, 方石英, 析晶, 烧结气氛, 元素掺杂

Abstract: The crystallization phenomenon of fused silica ceramics in use has received much attention. In this paper, XRD, SEM, FT-IR and XPS were used to study the effects of phase structure, surface morphology and chemical bond on the crystallization behavior of SiBON ceramics. The results show that the precipitation of cristobalite can be effectively inhibited by sintering SiBON ceramics at 1 550 ℃ under the protection of nitrogen. In contrast, the crystallization inhibition effect of samples sintered at the same temperature in vacuum atmosphere is not significant. The phase composition of SiBON ceramics is amorphous SiBON, Si₃N₄, and BN. The mechanism of suppressing crystallization of SiBON ceramics is that the doping of B and N elements converts the Si—O—Si bonds in SiO₂ into B—O—Si and Si—O—N bonds, and the resulting Si—B—O—N amorphous structure improves the SiO₂ crystallization activation energy.

Key words: SiBON ceramics, cristobalite, crystallization, sintering atmosphere, element doping

中图分类号:

TB321

张衡, 吴赟, 李道谦, 李卓霖, 王怡洋, 吴松松, 孙志远, 温广武. 热处理气氛对SiBON陶瓷材料析晶行为的影响[J]. 硅酸盐通报, 2021, 40(9): 3114-3121.

ZHANG Heng, WU Yun, LI Daoqian, LI Zhuolin, WANG Yiyang, WU Songsong, SUN Zhiyuan, WEN Guangwu. Effect of Heat Treatment Atmosphere on the Crystallization Behavior of SiBON Ceramic Materials[J]. BULLETIN OF THE CHINESE CERAMIC SOCIETY, 2021, 40(9): 3114-3121.

参考文献

[1] WAN W, FENG Y B, YANG J, et al. Microstructure, mechanical and high-temperature dielectric properties of zirconia-reinforced fused silica ceramics[J]. Ceramics International, 2016, 42(5): 6436-6443.
[2] ZHAI D, WEI C, ZHANG F C, et al. Microwave transmission performance of fused silica ceramics in microwave high-temperature heating[J]. Ceramics International, 2019, 45(5): 6157-6162.
[3] DUAN W J, YANG Z H, CAI D L, et al. Effect of sintering temperature on microstructure and mechanical properties of boron nitride whisker reinforced fused silica composites[J]. Ceramics International, 2020, 46(4): 5132-5140.
[4] WAN W, YANG J, FENG Y B, et al. Effect of trace alumina on mechanical, dielectric, and ablation properties of fused silica ceramics[J]. Journal of Alloys and Compounds, 2016, 675: 64-72.
[5] 闫法强,陈斐,沈强,等.放电等离子烧结技术制备熔融石英陶瓷[J].硅酸盐通报,2007,26(2):362-365+381.
YAN F Q, CHEN F, SHEN Q, et al. Fabrication of fused silica ceramics by spark plasma sintering technique[J]. Bulletin of the Chinese Ceramic Society, 2007, 26(2): 362-365+381 (in Chinese).
[6] 徐常明,王士维,黄校先,等.无压烧结制备Si₃N₄/SiO₂复合材料[J].无机材料学报,2006,21(4):935-938.
XU C M, WANG S W, HUANG X X, et al. Preparation of Si₃N₄/SiO₂ composites with pressureless sintering[J]. Journal of Inorganic Materials, 2006, 21(4): 935-938 (in Chinese).
[7] 卜景龙,王志发,窦光涛,等.熔融石英陶瓷材料的晶化抑制研究[J].稀有金属材料与工程,2007,36(S1):357-360.
BU J L, WANG Z F, DOU G T, et al. Study on inhibiting crystallization of fused quartz ceramic materials[J]. Rare Metal Materials and Engineering, 2007, 36(S1): 357-360 (in Chinese).
[8] 郑斌,刘家臣,杜海燕,等.氮化硼对熔融石英析晶行为的影响[J].稀有金属材料与工程,2013,42(S1):370-372.
ZHENG B, LIU J C, DU H Y, et al. Effect of boron nitride on crystallization of the quartz ceramics[J]. Rare Metal Materials and Engineering, 2013, 42(S1): 370-372 (in Chinese).
[9] LI J Q, ZHANG Y J, LI G Z. Preparation and characterization of SiBON fiber[J]. Materials Letters, 2012, 89: 266-268.
[10] 范叶明.SiBON玻璃陶瓷的塑性成形与反应热处理工艺研究[D].哈尔滨:哈尔滨工业大学,2008.
FAN Y M. Research on plastic forming and reaction heat treatment process of SiBON glass ceramics[D]. Harbin: Harbin Institute of Technology, 2008 (in Chinese).
[11] 吴赟.基于Si₃N₄-B₂O₃反应的SiBON陶瓷及天线罩制备工艺与性能研究[D].哈尔滨:哈尔滨工业大学,2011.
WU Y. Research on preparation process and performance of SiBON ceramics and radome based on Si₃N₄-B₂O₃ reactions[D]. Harbin: Harbin Institute of Technology, 2011 (in Chinese).
[12] 张文宇,郑勇,程鹏,等.表面析晶对熔融石英微波介电性能的影响[J].电子元件与材料,2014,33(6):34-37+41.
ZHANG W Y, ZHENG Y, CHENG P, et al. Effects of surface crystallization on the microwave dielectric properties of fused silica[J]. Electronic Components and Materials, 2014, 33(6): 34-37+41 (in Chinese).
[13] 周莹莹,孙润军,张昭环,等.氮化硼合成的工艺及性能研究[J].硅酸盐通报,2017,36(1):186-190.
ZHOU Y Y, SUN R J, ZHANG Z H, et al. Process and properties of boron nitride synthesis[J]. Bulletin of the Chinese Ceramic Society, 2017, 36(1): 186-190 (in Chinese).
[14] 陈和生,孙振亚,邵景昌.八种不同来源二氧化硅的红外光谱特征研究[J].硅酸盐通报,2011,30(4):934-937.
CHEN H S, SUN Z Y, SHAO J C. Investigation on FT-IR spectroscopy for eight different sources of SiO₂[J]. Bulletin of the Chinese Ceramic Society, 2011, 30(4): 934-937 (in Chinese).
[15] LIU J, WANG Q H, LI Y W, et al. Inhibiting crystallization of fused silica ceramic at high temperature with addition of α-Si₃N₄[J]. Ceramics International, 2021, 47(8): 11394-11404.
[16] SORARÙ G D, DALLABONA N, GERVAIS C, et al. Organically modified SiO₂-B₂O₃ gels displaying a high content of borosiloxane (B-O-Si) bonds[J]. Chemistry of Materials, 1999, 11(4): 910-919.
[17] MIURA Y, KUSANO H, NANBA T, et al. X-ray photoelectron spectroscopy of sodium borosilicate glasses[J]. Journal of Non-Crystalline Solids, 2001, 290(1): 1-14.
[18] BOIS L, L'HARIDON P, LAURENT Y, et al. Characterization of a boro-silicon oxynitride prepared by thermal nitridation of a polyborosiloxane[J]. Journal of Alloys and Compounds, 1996, 232(1/2): 244-253.
[19] AHMAD M, ZHAO J, PAN C F, et al. Ordered arrays of high-quality single-crystalline α-Si₃N₄ nanowires: synthesis, properties and applications[J]. Journal of Crystal Growth, 2009, 311(20): 4486-4490.
[20] LEE K S, KIM Y S, TOSA M, et al. Mechanical properties of hexagonal boron nitride synthesized from film of Cu/BN mixture by surface segregation[J]. Applied Surface Science, 2001, 169/170: 420-424.
[21] GREEN M L, GUSEV E P, DEGRAEVE R, et al. Ultrathin (<4 nm) SiO₂ and Si-O-N gate dielectric layers for silicon microelectronics: understanding the processing, structure, and physical and electrical limits[J]. Journal of Applied Physics, 2001, 90(5): 2057-2121.
[22] HUANG Y, YANG Z, LIU H, et al. XPS study on microporous surface composition of microchannel plates[J]. The International Society for Optical Engineering, 2011, 8194(3): 91-94.
[23] DING W Y, LI L, ZHANG L N, et al. An XPS study on the chemical bond structure at the interface between SiO_xN_y and N doped polyethylene terephthalate[J]. The Journal of Chemical Physics, 2013, 138(10): 104706.
[24] GOUIN X, GRANGE P, BOIS L, et al. Characterization of the nitridation process of boric acid[J]. Journal of Alloys and Compounds, 1995, 224(1): 22-28.