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硅酸盐通报 ›› 2018, Vol. 37 ›› Issue (6): 1929-1935.

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化学气相沉积六方氮化硼涂层的制备及应用

高世涛;李斌;李端;张长瑞;刘荣军;王思青   

  1. 国防科技大学新型陶瓷纤维及其复合材料重点实验室,长沙,410073
  • 出版日期:2018-06-15 发布日期:2021-01-18
  • 基金资助:
    信息系统预研项目(31512010402)

Preparation Process and Application of Hexagonal Boron Nitride Coating by Chemical Vapor Deposition

GAO Shi-tao;LI Bin;LI Duan;ZHANG Chang-rui;LIU Rong-jun;WANG Si-qing   

  • Online:2018-06-15 Published:2021-01-18

摘要: 六方氮化硼(h-BN)涂层是一种性能优异的功能陶瓷材料,介绍了化学气相沉积( CVD)六方氮化硼涂层的制备工艺,综述了h-BN涂层的优异性能和应用现状,并对其研究发展趋势进行了展望.认为先驱体性能存在缺陷、沉积机理复杂、工艺可控性差、生产成本高是目前CVD制备h-BN涂层存在的主要工艺问题,指出今后还需在新型先驱体的研发和使用、沉积机理的深入探究、工艺优化和放大等方面开展深入研究,以实现h-BN涂层的大规模工业化生产和应用.

关键词: 化学气相沉积;六方氮化硼;涂层;工艺;应用

Abstract: Hexagonal boron nitride(h-BN) coating is one of the most promising functional ceramics due to its remarkable properties.In this paper, the preparation process of h-BN coating by chemical vapor deposition ( CVD ) was introduced, and the excellent performances and applications were reviewed. Moreover, the development trend of the research was prospected.Several problems in the CVD process of h-BN coating were discussed such as the defect of the boron nitride precursors, the complexity of the deposition mechanism, the poor controllability and high cost of the process.In order to realize the industrialization and application of the h-BN coating by CVD, it is recommended to have a more in-depth research in the fields of precursor, deposition mechanism, optimization and scale-up of the process.

Key words: chemical vapor deposition;hexagonal boron nitride;coating;process;application

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