关键词: 强流脉冲离子束(HIPIB) ITO薄膜 原子力显微镜(AFM)

Abstract: ITO films were successfully deposited by high-intensity,high-temperature plasma produced by the irradiation of an intense(～108W/cm2), pulsed(70ns)ion beam onto an ITO ceramic target at a uniquely quick instantaneous deposition rate which is several orders of magnitude higher than that of any other conventional deposition technique.The film thickness of about 65nm is obtained in one shot by pulse.The analysis on the nanostructure of the films was made by the atomic force microscopy,from which the effect of the thickness on the flatness of the films was found.The films produced by one shot show smooth surfaces.